
High Purity Molybdenum Discs Mo Targets
Product Details:
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Place of Origin: | CHINA |
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Brand Name: | JINXING |
Certification: | ISO 9001 |
Model Number: | Ion implantation source of molybdenum parts for semiconductor application |
Payment & Shipping Terms:
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Minimum Order Quantity: | 10 kg |
Price: | Negotiable |
Packaging Details: | plywood cases |
Delivery Time: | 15-20 days |
Payment Terms: | L/C, T/T, D/P, Western Union |
Supply Ability: | 200 kg per month |
Detail Information |
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Product Name: | Ion Implantation Source Of Molybdenum Parts For Semiconductor Application | Grade: | Mo |
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Density: | 10.2 G/cm3 | Purity: | >=99.95% |
Tensile Strength: | >320 MPa | Elongation: | <22% |
Standard: | ASTM B387-2010 | Applications: | Precision Moulding |
Highlight: | Ion Implantation Molybdenum Products,Semiconductor Ion Implantation Source,Molybdenum Ion Implantation Source |
Product Description
To help its customers boost productivity and encourage technological innovation, JX attaches particular importance to research and development.
The company works together closely with its customers to develop new materials and product solutions for forward-looking technologies.
As a leading enterprise in the field of powder metallurgy, JX covers the entire production process in-house – from the ore right to the customer-specific component. To do this, it presses and sinters metal powder and performs a range of deforming operations to manufacture extremely tough, reliable products.
We provides high quality, precision machined molybdenum and tungsten components for processing equipment used in the manufacture of semiconductors, including Ion Implantation, MOCVD, CVD, PVD.
Ours manufacturing experience, expertise, and knowledge of the molybdenum and tungsten materials enable us to provide precision machined components that meet your specifications.
We supply tungsten, molybdenum, titanium and advanced ceramic components and spare parts for ion implanter in OEM quality.
Our main products including cathode, arc chamber, repeller, side/end plate and fastener in ion source of axcelis and varian implanter worked in production processing of 12" and 16" wafer.
Applied Materials: 9000, 9200, 9200xR, 9500, 9500xR,
Varian Semiconductor Equipment:VIISta 3000, Genus, Kestrel, VIISta 810 XE/XER, VIISta 900 XPT, VIISion, E220, E500, VIISta 810, VIISta 810 XE, VIISta 900, VIISta 900XP, 300D, 300XP, 350D
Axcelis: GSD HC (200/200E/200E2), HC3, Ultra, Eterna, GSD 100, GSD 160A, GSD 200E, GSD 200E^2, GSD HC, GSD HC3, GSD III, GSD III LE, GSD LED, NV GSD, NV 10-160, NV 10-180, NV 10-80, Optima HD, ULE, Ultra, GSD HE, GSD VHE, GSD HE, GSD HE3, GSD VHE, Optima XE, Paradigm XE, NV 3206/3204, NV 6200, NV 8200, NV 8250, Optima MD
The superiority, practicability and broad market prospects of the surface treatment technology have been recognized by more and more departments and units, and have been widely used. According to years of research and development, metal ion implantation is particularly suitable for the surface treatment of the following types of tools, molds and parts:
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