PVD Titanium Alloy Sputtering Target
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Product Details:
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| Place of Origin: | China |
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| Brand Name: | JX |
| Certification: | ISO |
| Model Number: | High Purity Titanium Aluminum Sputtering Target TiAl7030 |
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Payment & Shipping Terms:
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| Minimum Order Quantity: | 10kgs |
| Price: | USD50-100 |
| Packaging Details: | Standard packing |
| Delivery Time: | 15days |
| Payment Terms: | L/C, T/T |
| Supply Ability: | 2ton、 |
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Detail Information |
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| Purity: | High Purity Titanium Aluminum Sputtering Target TiAl7030 | Shape: | Rod |
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| Process: | HIP | Size: | 20-250 |
| Technics: | Vacuum Melting | ||
| Highlight: | Titanium Aluminum Sputtering Targets,High Purity Sputtering Targets,TiAl7030 Sputtering Targets |
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Product Description
high purity Titanium Aluminum Sputtering Target TiAl7030
To better serve you, we would like to discuss your specific requirement, Please Contact Us for a quote.
Titanium Aluminum Sputtering Target Features
Titanium aluminum alloy sputtering target can be made by two ways, HIP and melting.
The target by HIP will be higher density. The target by melting will be higher purity. All is based on your application.
Purity: Al-Ti 35/65 at% Al/Ti 50/50 at%, 99.95%, 99.5%
Shape: Discs, Plate, Step (Dia 300mm, Thickness 1mm) Rectangle, Sheet, Step (Length 1000mm, Width 300mm, Thickness 1mm) Tube(Diameter< 300mm, Thickness >2mm )
Application: Primary used in tools coating, Non-corrosion Valve/Chemical Plants, Marine Industry.
Titanium Aluminum Sputtering Target Description
| Purity | Al-Ti (35/65at%), Al/Ti (50:50 at%),AlTi 97/3wt%, AiTi 95/5wt%, AlTi 90/10wt% |
| Shape | Discs, Plate, Step (Dia ≤300mm, Thickness ≥1mm) Rectangle, Sheet, Step (Length ≤1000mm, Width ≤300mm, Thickness ≥1mm) Tube( Diameter< 300mm, Thickness >2mm |
| Certification | ISO 9001:2008 |
| Specification | Customized as request |
| Process | Forged , Rolling , Grinding |
| Application |
1. Electroplating; 2. Chemical engineering & Petrochemical technology; 3. Medical |
| Density/Orgin country | 4.51g/cm3 /Henan province |
Titanium Aluminum Sputtering Target TiAl7030 Picture:
| High pure metal sputtering target | |||
| Aluminum | Al | pellet,round,planar,rotatable target | 3N~6N |
| Chronium | Cr | 2N~3N5 | |
| Platinum | Pt | 4N~5N | |
| Nickel | Ni | 4N~5N | |
| Cobalt | Co | 3N~4N | |
| Zirconium | Zr | 2N2~4N | |
| Titanium | Ti | 4N~5N | |
| Copper | Cu | 4N~5N | |
| Molybdenum | Mo | 3N~4N | |
| Niobium | Nb | 3N5 | |
| Tatalum | Ta | 4N5 | |
| Tungsten | W | 3N5 | |
| Hafnium | Hf | 3N | |
| Vanadium | V | 2N5~3N | |
Hot Tags: tial round tial titanium-alunium target used in functional films, China, manufacturers, suppliers, factory, company, wholesale, products
| Titanium Aluminum Alloy target/Ti-Al target Ti: Al 33:67% | |||||||||
| Ti | Al | Fe | Si | Mg | Cl | C | Mn | O | N |
| 46.30 | 53.20 | 0.075 | 0.066 | 0.030 | 0.013 | 0.016 | 0.008 | 0.095 | 0.003 |
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JINXING MATECH is an expert provider on the metal solution. Especially on the products such as Tungsten Alloy , Tungsten copper , Titanium , Zirconium, Vanadium, Hafnium, Sputtering target , Nobel metal etc,
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| NO.57 KEXUEDADAO ROAD |
| 86-371-18137338517 |
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