PVD Titanium Alloy Sputtering Target
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Product Details:
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| Place of Origin: | China |
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| Brand Name: | Jinxing |
| Certification: | ISO |
| Model Number: | TiAl Ti75Al25 Round Bar For Sputtering |
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Payment & Shipping Terms:
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| Minimum Order Quantity: | 10kgs |
| Price: | 10-100USD/kg |
| Packaging Details: | Standard exporting package |
| Delivery Time: | 10days |
| Payment Terms: | L/C, T/T |
| Supply Ability: | 10ton month |
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Detail Information |
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| Purity: | Al-Ti (35/65at%), Al/Ti (50:50 At%) | Shape: | Discs, Plate, Step |
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| Certification: | ISO 9001:2008 | Specification: | Customized As Request |
| Process: | HIP | Name: | Ti75Al25 Round Bar For Sputtering |
| Highlight: | Ti75Al25 Titanium Aluminum Round Bar,HIP Titanium Aluminum Round Bar,HIP Ti75Al25 Round Bar |
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Product Description
Ti75Al25 Round Bar For Sputtering
TiAl Target 75:25
Product Name: Titanium Aluminum target 75:25 at%
Titanium Aluminum 75:25 at%
TiAl targets are produced in a meltmetallurgical process.
Application
Ti75Al25 Round Bar For Sputtering are used for wear resistant coatings, e.g. cutting tools.
Purity
Metallic purity ≥ 99.8%
Composition ratio
75:25 at%
Form of Delivery
Sputtering targets, arc cathodes, round targets up to ? 220 mm in one segment, rectangular targets up to a length of 1100 mm and a width of 200 mm in one segment.
Chemical Analysis in wt%
Fe <0.07
C <0.03
O <0.15
N <0.03
H <0.01
Tolerance of Al and Ti +/- 1 wt%
Physical Properties
Melting point: 1620°C
Density supplied: ≥ 4.18 g/cm3
Ti75Al25 Round Bar For Sputtering Picture:
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