PVD Titanium Alloy Sputtering Target
|
Product Details:
|
|
| Place of Origin: | China |
|---|---|
| Brand Name: | JINXING |
| Certification: | ISO 9001 |
| Model Number: | Titanium Aluminum Sputtering Target |
|
Payment & Shipping Terms:
|
|
| Minimum Order Quantity: | 1kg |
| Packaging Details: | Plywood case |
| Delivery Time: | 10～25 work days |
| Payment Terms: | L/C, D/A, D/P, T/T, Western Union |
| Supply Ability: | 100000kgs/M |
|
Detail Information |
|||
| Material: | Titanium Aluminum Alloy (TiAl) | Size: | Customized |
|---|---|---|---|
| Application: | PVD Coating System | Shape: | Round , Plate, Tube |
| Process: | CIP, HIP Pressing | Grain Size: | Fine Grain Size, Good Density |
| Highlight: | Aluminum Alloy Sputtering Targets,Titanium Sputtering Targets,HIP Pressing Sputtering Targets |
||
Product Description
|
Titanium Sputtering target Size |
1. Round target: Ø30--2000mm, thickness 3.0mm--300mm;2. Plate Targe: Length: 200-500mm Width:100-230mm Thickness:3--40mm3. Tube target: Dia:30-200mm Thickness:5-20mm Length:500-2000mm4. Customized is available |
|
Grade |
Titanium (Gr1, Gr2, Gr5, Gr7,GR12) Alloy target: Ti-Al, Ti-Cr, Ti-Zr etc |
|
Purity |
99.5%,99.95%, 99.98% 9999 metal shooting pvd titanium alloy sputtering targets |
|
Certification |
ISO 9001:2015 & Gold suppier on ALIBABA, Material Mill Test Report |
|
Technique |
Vacuum Melting, Patented thermo-mechanical process |
|
Shape |
Round target,Tube target,Flat target, according to your request |
|
Application |
Semiconductor separation, Film coating materials, Storage Electrode coating, Sputtering coating, Surface coating, Glass coating industry. |
High Purity Titanium Aluminum (Ti-Al) Alloy Sputtering Targets
Chemical Formula: Al/Ti
Purity: 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
The aluminum titanium sputtering target is available in various forms, purities, sizes, and prices.
Titanium aluminum alloy sputtering target can be made by two ways, HIP and melting. The Titanium Aluminum sputtering targets are available in a comprehensive range of compositions, purity levels, shapes, and dimensions. For instance, the most common forms of targets including round, rectangular, ring and tube.
They are in single or multiple sections construction depending on the size of the Ti-Al sputtering target and the properties of the material. We can customize to suit your needs.
Product Introduction
High Purity Titanium Aluminum (Ti-Al) Alloy Sputtering Targets Picture:
Enter Your Message
JINXING MATECH is an expert provider on the metal solution. Especially on the products such as Tungsten Alloy , Tungsten copper , Titanium , Zirconium, Vanadium, Hafnium, Sputtering target , Nobel metal etc,
| JINXING MATECH CO LTD |
| NO.57 KEXUEDADAO ROAD |
| 86-371-18137338517 |
| admin@jxmatech.com |