
PVD Titanium Alloy Sputtering Target
Product Details:
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Place of Origin: | China |
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Brand Name: | JINXING |
Certification: | ISO 9001 |
Model Number: | Copper Sputtering Target |
Payment & Shipping Terms:
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Minimum Order Quantity: | 1kg |
Price: | 15~100USD/kg |
Packaging Details: | Plywood case |
Delivery Time: | 10~25 work days |
Payment Terms: | L/C, D/A, D/P, T/T, Western Union |
Supply Ability: | 100000kgs/M |
Detail Information |
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Material: | Copper Granular 99.9999% | Process: | CIP, HIP Pressing |
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Size: | Customized | Application: | PVD Coating, |
Density: | 8.96g/cm3 | Shape: | Round , Plate , Tube Sputtering Target |
Grain Size: | Fine Grain Size, Good Density | Purity: | 99.999%, 99.9999% |
Highlight: | 6N Electrolytic Sputtering Targets,Copper Granular Sputtering Targets,8.96 g/cm3 Sputtering Targets |
Product Description
6N ultra-high purity electrolytic copper is mainly used in the production of sputtering target, evaporation film and anode materials for integrated circuits.
Purity: 99.999% ~ 99.9999%
For precise control of impurity content, Ag content can be controlled below 0.1ppm and s content below 0.02ppm
The content of gas elements (C, O, N, H) is less than 1ppm
Main uses: 6N copper has some properties similar to gold, good conductivity, ductility, corrosion resistance and surface performance, and low softening temperature. As a new kind of material, high-purity copper is not only used in the preparation of high-purity analytical standard test materials, various connecting wires for electronic industry, bonding wires for electronic packaging, high-quality audio wires and integrated circuits, sputtering targets for liquid crystal display and ion coating, but also an indispensable and precious material in the atomic energy, rocket, missile, aviation, aerospace and metallurgical industries . As a new material, ultra pure copper has been paid more and more attention. In addition to the preparation of high-purity analytical standard test materials, various connecting wires for electronic industry, bonding wires for electronic packaging, high-quality audio wires and integrated circuits, sputtering targets and ion coating for liquid crystal display, high-quality audio circuits and other high-tech fields, high-purity copper is also used in atomic energy, rockets, missiles, aviation, space navigation and other fields Precious materials are indispensable in metallurgical industry. With the development of high and new technology and the need of strategic materials, high-purity metals have higher and higher requirements for purity. The preparation and application of high-purity and ultra-high-purity metals in modern materials science and engineering are new and growing fields.
Copper Granular 99.9999% , Copper Cylinder Target 99.999% are available in varying sizes
Sizes: 3x3mm , 6x6mm, 3x6mm etc
Plate sputtering targets:
Thickness: 0.04 to 1.40" (1.0 to 35mm).
Width up to 20"(50 to 500mm).
Length: 3.9" to 6.56 feet( 100-2000mm)
other sizes as requested.
Cylinder sputtering targets:
3.94 Dia. x 1.58"(100 Dia. x 40mm)
2.56 Dia. x 1.58" (65 Dia. x 40mm)
or 63*32mm other sizes as requested.
Tube sputtering targets:
2.76 OD x 0.28 WT x 39.4”L (70 OD x 7 WT x 1000mm L)
3.46 OD x 0.39 WT x 48.4”L (88 OD x 10 WT x 1230mm L)
other sizes as requested.
Advantage:
1. Purity: 99.99% ~ 99.9999%
2. High density, no defects inside, even grains and smooth surface
3. Unique melting and casting pollution control process
4. It can meet the needs of customized alloy
5. Unique homogenization control technology of added elements
6. Unified microstructure control
High purity copper refers to metal copper with a purity of more than 4N. High purity copper has a very small grain boundary area, few lattice defects, some of its properties are similar to gold, with good conductivity, ductility, corrosion resistance and surface performance, while softening temperature is relatively low. High purity copper has high thermal conductivity and excellent processing performance at the base temperature. High purity copper is widely used in integrated circuit, electronic packaging, photovoltaic solar power technology and other fields. In recent years, with the development of high-tech industry, high-purity copper has been widely used. The preparation of high-purity copper is usually divided into two steps of purification and super purification. The preparation of high-purity copper generally takes crude copper as the raw material, and further removes the impurities to obtain 5n-7n high-purity copper. At present, the main methods of preparing high purity copper are area refining, anion exchange and electrolytic refining. The regional refining method is one of the main methods to prepare high-purity metals. At present, the regional refining methods of high-purity copper include floating regional refining method and desulfurization regional refining method
Product Name | Element | Purirty | Melting Point ℃ | Density (g/cc) | Available Shapes |
High Pure Sliver | Ag | 4N-5N | 961 | 10.49 | Wire, Sheet, Particle, Target |
High Pure Aluminum | Al | 4N-6N | 660 | 2.7 | Wire, Sheet, Particle, Target |
High Pure Gold | Au | 4N-5N | 1062 | 19.32 | Wire, Sheet, Particle, Target |
High Pure Bismuth | Bi | 5N-6N | 271.4 | 9.79 | Particle, Target |
High Pure Cadmium | Cd | 5N-7N | 321.1 | 8.65 | Particle, Target |
High Pure Cobalt | Co | 4N | 1495 | 8.9 | Particle, Target |
High Pure Chromium | Cr | 3N-4N | 1890 | 7.2 | Particle, Target |
High Pure Copper | Cu | 3N-6N | 1083 | 8.92 | Wire, Sheet, Particle, Target |
High Pure Ferro | Fe | 3N-4N | 1535 | 7.86 | Particle, Target |
High Pure Germanium | Ge | 5N-6N | 937 | 5.35 | Particle, Target |
High Pure Indium | In | 5N-6N | 157 | 7.3 | Particle, Target |
High Pure Magnesium | Mg | 4N | 651 | 1.74 | Wire, Particle, Target |
High Pure Magnesium | Mn | 3N | 1244 | 7.2 | Wire, Particle, Target |
High Pure Molybdenum | Mo | 4N | 2617 | 10.22 | Wire, Sheet, Particle, Target |
High Pure Niobium | Nb | 4N | 2468 | 8.55 | Wire, Target |
High Pure Nickel | Ni | 3N-5N | 1453 | 8.9 | Wire, Sheet, Particle, Target |
High Pure Lead | Pb | 4N-6N | 328 | 11.34 | Particle, Target |
High Pure Palladium | Pd | 3N-4N | 1555 | 12.02 | Wire, Sheet, Particle, Target |
High Pure Platinum | Pt | 3N-4N | 1774 | 21.5 | Wire, Sheet, Particle, Target |
High Pure Silicon | Si | 5N-7N | 1410 | 2.42 | Particle, Target |
High Pure Tin | Sn | 5N-6N | 232 | 7.75 | Wire, Particle, Target |
High Pure Tantalum | Ta | 4N | 2996 | 16.6 | Wire, Sheet, Particle, Target |
High Pure Tellurium | Te | 4N-6N | 425 | 6.25 | Particle, Target |
High Pure Titanium | Ti | 4N-5N | 1675 | 4.5 | Wire, Particle, Target |
High Pure Tungsten | W | 3N5-4N | 3410 | 19.3 | Wire, Sheet, Particle, Target |
High Pure Zinc | Zn | 4N-6N | 419 | 7.14 | Wire, Sheet, Particle, Target |
High Pure Zirconium | Zr | 4N | 1477 | 6.4 | Wire, Sheet, Particle, Target |
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