Name: Titanium Sputter Target High Purity Fine Grain Size 4.52 G/Cm3
Brand: JINXING MATECH CO LTD
SKU: high purity Titanium Sputtering Target
Price: negotiable USD
Availability: InStock

Titanium Sputter Target High Purity Fine Grain Size 4.52 G/Cm3

Product Details:

Place of Origin:

China

Brand Name:

JINXING

Certification:

ISO 9001

Model Number:

high purity Titanium Sputtering Target

Payment & Shipping Terms:

Minimum Order Quantity:

1kg

Price:

20～200USD/kg

Packaging Details:

Plywood case

Delivery Time:

10～25 work days

Payment Terms:

L/C, D/A, D/P, T/T, Western Union

Supply Ability:

100000kgs/M

Detail Information
Shape:	Round , Plate, Tube	Process:	CIP, HIP Pressing
Size:	Customized	Application:	PVD Coating System
Material:	High Purity Titanium Sputtering Target	Grain Size:	Fine Grain Size, Good Density
Purity::	99.95%, 99.99%, 99.999%	Density:	4.52g/cm3
Highlight:	Fine Grain Size Titanium Sputter Target , High Purity Titanium Target , 4.52 g/cm3 Sputter Target

Product Description

High purity Titanium Sputtering Target 99.99%, 99.999%

High purity material, ultra-high purity material, semiconductor high purity material

Materials world provides high-purity materials from 4N to 7N: as the basic materials of semiconductor industry and electronic industry, high-purity materials are widely used in various industrial fields, including field luminescent covers, thermoelectronics, electronics, information, infrared, solar cells, high-performance alloys, etc. Jinxing matech supplies a full range of ultra-high purity materials to meet the needs of domestic and international customers. We not only provide high-purity raw materials, but also can make various high-purity raw materials for customers, such as ultra-high purity metal magnetron sputtering target, solar cell magnetron sputtering target, solar film evaporation coating material, electronic high-purity wire rod, strip, powder...

Magnetron sputtering target material forming method: the material forming method is selected according to the product performance and different requirements of customers. In general, when the melting point of materials is low, it is necessary to use vacuum melting, casting, forging and rolling to eliminate porosity. Of course, effective heat treatment is necessary to refine the uniform grain material. Materials with high melting point (or materials with high brittleness) are formed by hot pressing or hot isostatic pressing, and some are formed by cold isostatic pressing and then sintered. All kinds of sputtering target materials provided by our company have proper technology, high density, uniform grain and long service life...

High purity Titanium Sputtering Target 99.99% , High purity Titanium Sputtering Target 99.999%

are available in varying sizes

D100x40mm , D101.6x6.35mm etc

Product Name	Element	Purirty	Melting Point ℃	Density (g/cc)	Available Shapes
High Pure Sliver	Ag	4N-5N	961	10.49	Wire, Sheet, Particle, Target
High Pure Aluminum	Al	4N-6N	660	2.7	Wire, Sheet, Particle, Target
High Pure Gold	Au	4N-5N	1062	19.32	Wire, Sheet, Particle, Target
High Pure Bismuth	Bi	5N-6N	271.4	9.79	Particle, Target
High Pure Cadmium	Cd	5N-7N	321.1	8.65	Particle, Target
High Pure Cobalt	Co	4N	1495	8.9	Particle, Target
High Pure Chromium	Cr	3N-4N	1890	7.2	Particle, Target
High Pure Copper	Cu	3N-6N	1083	8.92	Wire, Sheet, Particle, Target
High Pure Ferro	Fe	3N-4N	1535	7.86	Particle, Target
High Pure Germanium	Ge	5N-6N	937	5.35	Particle, Target
High Pure Indium	In	5N-6N	157	7.3	Particle, Target
High Pure Magnesium	Mg	4N	651	1.74	Wire, Particle, Target
High Pure Magnesium	Mn	3N	1244	7.2	Wire, Particle, Target
High Pure Molybdenum	Mo	4N	2617	10.22	Wire, Sheet, Particle, Target
High Pure Niobium	Nb	4N	2468	8.55	Wire, Target
High Pure Nickel	Ni	3N-5N	1453	8.9	Wire, Sheet, Particle, Target
High Pure Lead	Pb	4N-6N	328	11.34	Particle, Target
High Pure Palladium	Pd	3N-4N	1555	12.02	Wire, Sheet, Particle, Target
High Pure Platinum	Pt	3N-4N	1774	21.5	Wire, Sheet, Particle, Target
High Pure Silicon	Si	5N-7N	1410	2.42	Particle, Target
High Pure Tin	Sn	5N-6N	232	7.75	Wire, Particle, Target
High Pure Tantalum	Ta	4N	2996	16.6	Wire, Sheet, Particle, Target
High Pure Tellurium	Te	4N-6N	425	6.25	Particle, Target
High Pure Titanium	Ti	4N-5N	1675	4.5	Wire, Particle, Target
High Pure Tungsten	W	3N5-4N	3410	19.3	Wire, Sheet, Particle, Target
High Pure Zinc	Zn	4N-6N	419	7.14	Wire, Sheet, Particle, Target
High Pure Zirconium	Zr	4N	1477	6.4	Wire, Sheet, Particle, Target

Tag:

Titanium Sputter Target High Purity Fine Grain Size 4.52 G/Cm3

Fine Grain Size Titanium Sputter Target

High Purity Titanium Target

4.52 g/cm3 Sputter Target

High purity Titanium Sputtering Target 99.99%, 99.999%

tungsten sputtering target

metal sputtering targets

titanium sputter target

JINXING MATECH is an expert provider on the metal solution. Especially on the products such as Tungsten Alloy , Tungsten copper , Titanium , Zirconium, Vanadium, Hafnium, Sputtering target , Nobel metal etc,